Semiconductor Process Monitoring
To address the needs of chemical wet process liquid concentration management, we have developed a high-precision chemical liquid concentration meter." This device uses near-infrared spectroscopy absorption and electrochemical principles to complete concentration measurements of common etchants/cleaners such as HF, H2SO4, TMAH, and others in seconds, with an accuracy of ±0.01%. The device can operate continuously in high-temperature strong acid environments (resistant to PFA materials). It features built-in compensation algorithms to eliminate measurement errors caused by temperature and bubble interference, enabling real-time data transmission with factory central control systems, and the product has passed SEMI S2, CE, and other certifications.